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3M-NANO 2021 Secretariat:

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  Keynote Speakers  
 

 

 

Fumihito Arai

Professor

Department of Micro-Nano Systems Engineering

Department of Mechanical Science & Engineering
Nagoya University

Japan

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Tianhong Cui

Professor

Department of Mechanical Engineering

Nanofabrication Center
University of Minnesota

USA

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Harald Fuchs

Professor

Head

Nano- and Interface Physics Group
University of Münster

Germany

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Eberhard Manske

Professor

Institute of Process Measurement and Sensor Technology

Faculty of Mechanical Engineering
Ilmenau University of Technology

Germany

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Title: Tip- and laser- based nanofabrication in extended areas with sub-nanometre precision

Abstract: For several years, new tip‐based or laser‐based patterning techniques have been attracting increasing attention as alternative lithography approaches. Most tip‐based techniques are based on the use of commercial or modified atomic force microscopes (AFM) and have so far only been demonstrated at the micrometer scale. Direct laser writing is mostly based on galvanoscanners or (similar to the AFM methods) on piezo drives. The biggest disadvantage in all cases, however, is the insufficient measurement and positioning technology.
At the TU Ilmenau, nanopositioning and nanometrology machines based on advanced laser interferometers have been successfully developed over many years, which are able to overcome this deficit. Consequently, this technique is therefore applied to processes of tip‐ and laser‐based manufacturing. This will enable measurement and patterning at the atomic level on both flat and non‐flat surfaces (e.g. precision optical surfaces).
The laser interferometer‐based high‐precision machines now have resolution up to 5 picometers and sub‐nanometer reproducibility in measurement ranges up to 200 mm x 200 mm. They can be used with AFM heads for both lithography purposes and high‐resolution measurement of fabricated structures. In addition, direct laser writing was demonstrated with both single‐photon processes (at 405 nm) and two‐photon processes based on femtosecond lasers. New effects for laser‐based writing below the Rayleigh resolution limit were found and used.
UV nanoimprint lithography on flat as well as on curved surfaces was demonstrated as another technology. For direct laser writing on curved surfaces, a metrologically traceable 5‐axis machine concept was developed and experimentally tested. Combining advanced nanofabrication technologies with ultra‐precise nanopositioning and nanometrology, a unique symbiosis is created for alternative cross‐scale lithography approaches.


 

Mariusz Martyniuk

Associate Professor

SMIEEE Principal Research Fellow

School of Engineering, Electrical, Electronic and Computer Engineering
University of Western Australia

Australia

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Fumio Narita

Professor

Department of Materials Processing

Tohoku University

Japan

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Federico Rosei

Professor / Director

INRS-EMT, Univ. du Quebec

Fellow of the Royal Society of Canada
Materials and Technologies for Energy Conversion, Saving and Storage (MATECSS)

Canada

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Dong Sun

Professor

Fellow of Canadian Academy of Engineering

Department of Biomedical Engineering
Director of Centre for Robotics and Automation

City University of Hong Kong

China

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Kristina Tschulik

Professor

Chair of Analytical Chemistry II

Electrochemistry and Nanoscale Materials
Ruhr-University Bochum

Germany

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*The list of Keynote speakers is based on the alphabetical order of family names